Liquid processing apparatus, liquid processing method and storage medium

Inventor: Nobuaki Matsuoka
Original Assignee: Tokyo Electron Limited

Patent number: 8038769
Filing date: Feb 18, 2011
Issue date: Oct 18, 2011
Application number: 13/030,316

A liquid processing apparatus, includes an apparatus main body, a power room having an atmosphere separated from the clean room by a partition member, an air suction path configured to suction an air in the clean room and take the air into the power room, a temperature control part provided in the power room and configured to control at least a temperature of the air taken in via the air suction path, an air supplying path configured to supply the air from the temperature control part to the liquid processing unit, a ventilation part configured to take the air from the air suction path and supply the air via the air supplying path, and a cleaning filer configured to clean the air taken in from the air suction path.

Claims

What is claimed is:

1. A liquid processing method using a liquid processing apparatus, the liquid processing apparatus including an apparatus main body, the apparatus main body having:

a liquid processing unit provided in a clean room and configured to supply a chemical solution to a substrate and perform a liquid process;

a heating unit configured to perform a heating process on the substrate before or after the liquid process is performed by the liquid processing unit; and

a transferring part configured to transfer the substrate between the heating unit and the liquid processing unit;

the liquid processing method comprising:

a step of suctioning air in the clean room and taking the air into a power room having an atmosphere separated from the clean room by a partition member;

a step of controlling a temperature of the air taken in via the air suction path in the power room;

a step of supplying the air whose temperature is controlled to the liquid processing unit;

a step of suctioning the air from the air suction path and supplying the air via the air supplying path; and

a step of cleaning the air taken in from the air suction path;

wherein the air suction path and the air supplying path are formed by either an internal space of an internal pipe of a double pipe or a space between the internal pipe and an external pipe of the double pipe.

2. The liquid processing method as claimed in claim 1 further comprising:

a step of controlling moisture in the air taken in via the air suction path in the power room.

3. The liquid processing method as claimed in claim 1,

wherein the power room is formed under a floor of a room where the apparatus main body is provided.

4. The liquid processing method as claimed in claim 1,

wherein the number of the liquid processing units is plural;

one liquid processing unit is a resist coating unit configured to coat resist liquid onto the substrate; and

another liquid processing unit is a developing unit configured to supply developing liquid to the substrate and develop the resist.

5. The liquid processing method as claimed in claim 1,

wherein an opening for jetting the air is provided at a ceiling of the clean room; and

a step of suctioning the air in the clean room from the air suction path and taking the air in the power room is performed in a position having the same height as the apparatus main body or a position higher than the apparatus main body.

6. The liquid processing method as claimed in claim 1 further comprising:

a step of suctioning the air supplied to the liquid processing unit to the air suction path.

7. The liquid processing method as claimed in claim 1,

wherein the apparatus main body includes an electric unit having an electric apparatus; and

the liquid processing method further includes a step of suctioning an atmosphere of the electric unit to the air suction path.

8. The liquid processing method as claimed in claim 1,

wherein the apparatus main body includes a chemical unit where the chemical solution is stored; and

the liquid processing method further includes a step of suctioning an atmosphere of the chemical unit to the air suction path.

9. The liquid processing method as claimed in claim 8, further comprising:

a step of removing a chemical solution composition contained in the air suctioned into the air suction path from the chemical unit.

10. A recording medium where a computer program is stored, the computer program used for a liquid processing apparatus, the liquid being processing apparatus including an apparatus main body, the apparatus main body having:

a liquid processing unit provided in a clean room and configured to supply a chemical solution to a substrate and perform a liquid process;

a heating unit configured to perform a heating process on the substrate before or after the liquid process is performed by the liquid processing unit; and

a transferring part configured to transfer the substrate between the heating unit and the liquid processing unit;

the computer program implementing a liquid processing method, the liquid processing method comprising:

a step of suctioning air in the clean room and taking the air in a power room having an atmosphere separated from the clean room by a partition member;

a step of controlling a temperature of the air taken in via the air suction path in the power room;

a step of supplying the air whose temperature is controlled to the liquid processing unit;

a step of suctioning the air from the air suction path and supplying the air via the air supplying path; and

a step of cleaning the air taken in from the air suction path;

wherein the air suction path and the air supplying path are formed by either an internal space of an internal pipe of a double pipe or a space between the internal pipe and an external pipe of the double pipe.

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