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Applied Physics A, Volume 114, Issue 3, pp 965-972. (2014).
Sukhendu Jana, Sayan Das, Debasish De, Utpal Gangopadhyay, Prajit Ghosh, Anup Mondal.
Meghnad Saha Institute of Technology, Kolkata, 700150, India and
Center of Excellence for Green Energy and Sensor System, Bengal Engineering and Science University, Howrah, 7111103, India and
Dept. of Chemistry, Bengal Engineering and Science University, Howrah, 7111103, India.
Abstract
The annealing effect on structural and optical properties of the Diamond-like Nanocomposite (DLN) thin film deposited on glass substrate by Plasma Assisted Chemical Vapor Deposition (PACVD) method has been investigated. The films were annealed at temperature ranging from 300 to 600 °C, with 100 °C interval for 9 minutes by rapid thermal process (RTP) under vacuum. The structural changes of the annealed films have been studied using Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Scanning Electron Microscope (SEM), and optical parameters have been determined using transmittance and reflectance spectra in UV-UIS-NIR range. The result shows that the refractive index increases gradually from 1.79 to 2.84 with annealing temperature due to out-diffusion of H by breaking Si–H and C–H bond leads to Si–C bond, i.e. more cross linking structure. In higher temperature range, graphitization also enhanced the refractive index. However, the optical band gap at up to 400 °C initially increases from 3.05 to 3.20 eV and then decreases due to graphitization. The film has a great potential to be used as anti-reflection coating (ARC) on silicon-based solar cell.
