Comparison of CVD-deposited Ni and dry-blended Ni powder as sintering aids for TiN powder

Journal of the European Ceramic Society, Volume 34, Issue 8, August 2014, Pages 1955-1961.

Rong Tua, Peipei Zhua, Song Zhanga, Peng Xua, Lianmeng Zhanga, Hiroshi Hanekawab, Takashi Gotob

a State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070, People’s Republic of China and

b Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan.



Ni nanoparticles were precipitated on TiN powder via a rotary chemical vapour deposition (RCVD) method. The sintering behaviour and mechanical properties of the TiN, mixture of TiN and Ni, noted as TiN–Ni(blended), and Ni-precipitated TiN, noted as TiN–Ni(CVD), powders sintered by spark plasma sintering (SPS) were compared. The effects of O2 gas partial pressure (PO2in RCVD and of sintering temperature in SPS (T  S) on the crystalline phase, relative density (D  r), Vickers hardness (H  V) and fracture toughness (K  IC) of TiN–Ni(CVD)-sintered bodies were investigated. The mechanical properties of TiN ceramic were improved as CVD-deposited Ni as sintering aid for sintering. TiN–Ni(CVD) body-sintered at T  S = 1600 °C from TiN–Ni(CVD) powder prepared at PO2=160 Pa exhibited the highest Dr of 97.9% andHV = 15.5 GPa, higher than those of TiN- and TiN–Ni(blended)-sintered bodies, and relatively highKIC = 3.8 MPa m1/2.

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